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Volumn 86, Issue 4-6, 2009, Pages 885-888

Silicon nanostructuring for 3D bulk silicon versatile devices

Author keywords

3D nanostructure design; Hard mask; Hydrogen annealing; Silicon reflow

Indexed keywords

3D NANOSTRUCTURE DESIGN; BULK SILICONS; DESIGN CONFIGURATIONS; ELECTRONIC FUNCTIONS; ENHANCED MOBILITIES; FABRICATION METHODS; HARD MASK; HIGH-TEMPERATURE ANNEALING; HYDROGEN ANNEALING; HYDROGEN ATMOSPHERES; MATERIALS TECHNOLOGIES; NANO-STRUCTURING; SILICON BEAMS; SILICON MEMBRANES; SPECIFIC DESIGNS; VERTICAL DIMENSIONS;

EID: 67349147064     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.083     Document Type: Article
Times cited : (7)

References (7)
  • 1
    • 67349246793 scopus 로고    scopus 로고
    • S. Monfray et al., SON (Silicon-On-Nothing) Technological CMOS Platform: Highly Performant Devices and SRAM Cells, IEDM 04, Tech. Dig., p. 636.
    • S. Monfray et al., SON (Silicon-On-Nothing) Technological CMOS Platform: Highly Performant Devices and SRAM Cells, IEDM 04, Tech. Dig., p. 636.
  • 6
    • 67349084399 scopus 로고    scopus 로고
    • 3D Nanostructured Silicon Relying on Hard Mask Engineering for High Temperature Annealing (HME-HTA) Processes for Electronic Devices
    • M. Bopp et al., 3D Nanostructured Silicon Relying on Hard Mask Engineering for High Temperature Annealing (HME-HTA) Processes for Electronic Devices, NSTI08 Proceedings.
    • NSTI08 Proceedings
    • Bopp, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.