Homogeneous p+ emitter diffused using boron tribromide for record 16.4% screen-printed large area n-type mc-Si solar cell

Solar Energy Materials and Solar Cells

Volumn 93, Issue 6-7, 2009, Pages 750-752

  Komatsu, Y ^a   Mihailetchi, V D ^a   Geerligs, L J ^a   van Dijk, B ^b   Rem, J B ^b   Harris, M ^b  

^a TNO   (Netherlands)

^b Tempress Systems BV   (Netherlands)

Author keywords

BBr3; Boron emitter; mc Si; n type

Indexed keywords

BBR3; BORON DIFFUSIONS; BORON TRIBROMIDES; MC-SI; N-TYPE; QUARTZ TUBE FURNACES; SI SOLAR CELLS; STANDARD DEVIATIONS;

BORON COMPOUNDS; OXIDE MINERALS; PHOSPHORUS; PHOTOVOLTAIC CELLS; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON NITRIDE; SILICON SOLAR CELLS; SILICON WAFERS; SOLAR CELLS;

BORON;

EID: 67349117782     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.09.019     Document Type: Article

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