Role of hydrogen in the peeling of hydrogenated microcrystalline silicon films

Materials Science and Engineering: B

Volumn 159-160, Issue C, 2009, Pages 27-30

  Pham, N ^a,b   Djeridane, Y ^a   Abramov, A ^a   Hadjadj, A ^b   Cabarrocas, P Roca i ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b UNIVERSITÉ DE REIMS CHAMPAGNE ARDENNE   (France)

Author keywords

Adhesion; Hydrogen; Microcrystalline silicon

Indexed keywords

ELECTRONIC PROPERTIES; FILM PREPARATION; HYDROGEN; HYDROGENATION; METALLIC FILMS; MICROCRYSTALLINE SILICON; SECONDARY ION MASS SPECTROMETRY; SILICON NITRIDE; THIN FILM SOLAR CELLS; THIN FILM TRANSISTORS; THIN FILMS;

C. THIN FILM TRANSISTOR (TFT); CONDITION; DEVICE PROCESSING; FABRICATION COST; HYDROGENATED MICROCRYSTALLINE SILICON; MICROCRYSTALLINE SILICON FILMS; MULTILAYER STACKS; OPTICAL AND ELECTRONIC PROPERTIES; SILICON-BASED MATERIALS; ΜC-SI;

ADHESION;

EID: 67349107173     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.11.021     Document Type: Article

References (5)

1. Vetterl O., Finger F., Carius R., et al. Solar Energy Materials and Solar Cells 62 1-2 (2000) 97-108
2. Roca i Cabarrocas P., Djeridane Y., Bui V.D., Bonnassieux Y., and Abramov A. Solid State Electronics 52 (2008) 422
3. Branz H.M. Journal of Non-Crystalline Solids 299-302 (2002) 191-195
4. Beyer W., Wagner H., and Mell H. Solid State Communications 39 (1981) 375
5. Djeridane Y., Abramov A., and Roca i Cabarrocas P. Thin Solid Films 515 19 (2007) 7451-7454