A study on electrochemical growth behavior of the Co-Ni alloy nanowires in anodic aluminum oxide template

Journal of Alloys and Compounds

Volumn 480, Issue 2, 2009, Pages 275-278

  Ghahremaninezhad, A ^a   Dolati, A ^b  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^b SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

Electrochemical reactions; Magnetic measurements; Nanostructured materials; Transmission electron microscopy

Indexed keywords

AAO TEMPLATE; ANODIC ALUMINUM OXIDE TEMPLATE; CO-NI ALLOYS; DIFFUSION-CONTROLLED PROCESS; ELECTROCHEMICAL GROWTH; ELECTROCHEMICAL REACTIONS; GROWTH BEHAVIOR; HEMISPHERICAL HEADS; ION CONCENTRATIONS; MAGNETIC MEASUREMENTS; RAPID GROWTH; STEADY STATE; STRUCTURAL AND MAGNETIC PROPERTIES; TEM;

ALUMINA; ELECTRIC WIRE; ELECTROCHEMICAL CORROSION; ELECTRON MICROSCOPES; FILM GROWTH; MAGNETIC PROPERTIES; MAGNETIC VARIABLES MEASUREMENT; MONITORING; NANOSTRUCTURED MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

NANOWIRES;

EID: 67349099127     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.02.020     Document Type: Article

References (30)

1. Dolati A., Sababi M., Nouri E., and Ghorbani M. Mater. Chem. Phys. 102 (2007) 118
2. Dolati A., and Mahshid S.S. Mater. Chem. Phys. 108 (2008) 391
3. Goamez E., Ramirez J., and Valleas E. J. Appl. Electrochem. 28 (1998) 71
4. Chu S.Z., Inoue S., Wada K., and Kurashima K. Electrochim. Acta 51 (2005) 820
5. Xu J., and Xu Y. Appl. Surf. Sci. 253 (2007) 7203
6. Xu J., and Xu Y. Mater. Lett. 60 (2006) 2069
7. Xu J., Huang X., Xie G., Fang Y., and Liu D. Mater. Res. Bull. 39 (2004) 811
8. Saedi A., and Ghorbani M. Mater. Chem. Phys. 91 (2005) 417
9. Khan H.R., and Petrikowski K. Mater. Sci. Eng. C 19 (2002) 345
10. Zhu H., Yang S., Ni G., Yu D., and Du Y. Scripta mater. 44 (2001) 2291
11. Liu Q.F., Gao C.X., Xiao J.J., and Xue D.S. J. Magn. Magn. Mater. 260 (2003) 151
12. Sun S., Murray C.B., Weller D., et al. Science 287 (2000) 1989
13. Sun L., and Searson P.C. Appl. Phys. Lett. 74 (1999) 2803
14. Huang Q., Davis D., and Podlaha E.J. J. Appl. Electrochem. 36 (2006) 871
15. Chu S.Z., Wada K., Inoue S., and Todoroki S. Electrochim. Acta 48 (2003) 3147
16. Masuda H., Yada K., and Osaka A. Jpn. J. Appl. Phys. 37 (1998) 1340
17. Masuda H., and Hasegawa F. J. Electrochem. Soc. 144 (1997) 127
18. Masuda H., Yamada H., Satoh M., and Asoh H. Appl. Phys. Lett. 71 (1997) 2770
19. Jessensky O., Muller F., and Gosele U. Appl. Phys. Lett. 72 (1998) 1173
20. Ghorbani M., Nasirpouri F., Iraji zad A., and Saedi A. Mater. Design 27 (2006) 983
21. Sharma G., Pishko M.V., and Grimes C.A. Thin Solid Films 515 (2007) 3315
22. Jagminiene A., Valincius G., Riaukaite A., and Jagminas A. J. Crys. Growth 274 (2005) 622
23. Motoyama M., Fukunaka Y., Sakka T., and Ogata Y.H. Electrochim. Acta 53 (2007) 205
24. Motoyama M., Fukunaka Y., Sakka T., Ogata Y.H., and Kikuchi S. J. Electroanal. Chem. 584 (2005) 84
25. Konishi Y., Motoyama M., Matsushima H., Fukunaka Y., Ishii R., and Ito Y. J. Electroanal. Chem. 559 (2003) 149
26. Valizadeh S., George J.M., Leisner P., and Hultman L. Electrochim. Acta 47 (2001) 865
27. Schuchert I.U., Toimil Molares M.E., Dobrev D., Vetter J., Neumann R., and Martin M. J. Electrochem. Soc. 150 (2003) C189
28. Toimil Molares M.E., Buschmann V., Dobrev D., Neumann R., Scholz R., Schuchert I.U., and Vetter J. Adv. Mater. 13 (2001) 62
29. Paulus P.M., Luis F., Kroll M., Schmid G., and de Jongh L.J. J. Magn. Magn. Mater. 224 (2001) 180
30. Daimon H., Knakami O., Iangoya O., and Sakemoto A. Jpn. J. Appl. Phys. 132 (1991) 282