Experimental and kinetic studies of C-H-O plasmas for polycrystalline and nano-smooth diamond deposition

Diamond and Related Materials

Volumn 18, Issue 5-8, 2009, Pages 730-733

  Gries, T ^a   de Persis, S ^a   Vandenbulcke, L ^a   Met, C ^a   Delfau, J L ^a   De Barros Bouchet, M I ^b  

^a CNRS   (France)

^b ECOLE CENTRALE DE LYON   (France)

Author keywords

Deposition etching domains; Gaseous radicals and stable species; Modelling of plasma kinetics; Molecular beam mass spectrometry; Nano smooth diamond; Plasma diagnostics

Indexed keywords

DEPOSITION/ETCHING DOMAINS; GASEOUS RADICALS AND STABLE SPECIES; MODELLING OF PLASMA KINETICS; MOLECULAR BEAM MASS SPECTROMETRY; NANO-SMOOTH DIAMOND;

ATOMIC SPECTROSCOPY; DIAMOND CUTTING TOOLS; DIAMOND DEPOSITS; DIAMONDS; EMISSION SPECTROSCOPY; FLUID DYNAMICS; HYDROCARBONS; MASS SPECTROMETERS; MASS SPECTROMETRY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA PROBES; PLASMAS; SPECTRUM ANALYSIS;

DIAMOND FILMS;

EID: 67349084349     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2009.01.032     Document Type: Article

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