Carbon nanotube growth studies using an atmospheric, microplasma reactor

IEEE Transactions on Nanotechnology

Volumn 8, Issue 3, 2009, Pages 286-290

  Kona, S ^a   Kim, J H ^a   Harnett, C K ^a   Sunkara, M K ^a  

^a University of Louisville   (United States)

Author keywords

Carbon nanotubes (CNTs); Chemical vapor deposition (CVD); Microreactor

Indexed keywords

ATMOSPHERIC PLASMA DISCHARGE; BENEFICIAL EFFECTS; CARBON NANOTUBE ARRAY; CARBON NANOTUBE GROWTH; CONICAL MORPHOLOGY; MICRO-CAPILLARY; MICRO-PLASMA; MICRO-PLASMA DISCHARGES; MICROMETER SCALE; MICROREACTOR; NANOTUBE GROWTH; RADICAL DENSITIES; SUBMILLIMETER; SUBSTRATE TEMPERATURE; THERMAL CVD;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC TEMPERATURE; CARBON NANOTUBES; ELECTRIC DISCHARGES; PLASMA DENSITY; PLASMA DEPOSITION; PLASMA DEVICES; PLASMA DISPLAY DEVICES; PLASMAS; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 67249152681     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2008.2010544     Document Type: Article

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