Anisotropic luminescence photo-excitation in H2-loaded Ge-doped silica exposed to polarized 193 nm laser light

Journal of Non-Crystalline Solids

Volumn 355, Issue 18-21, 2009, Pages 1062-1065

  Lancry, M ^a   Poumellec, B ^a   Douay, M ^b  

^a UNIVERSITÉ PARIS SUD   (France)

^b UNIVERSITÉ DES SCIENCES ET TECHNOLOGIES DE LILLE   (France)

Author keywords

Defects; Laser matter interactions; Luminescence; Optical spectroscopy; Silica

Indexed keywords

193 NM LASER; GE-DOPED SILICA; LASER POLARIZATION; LASER-MATTER INTERACTIONS; OPTICAL SPECTROSCOPY; POLARIZATION DEGREE; POLARIZATION DEPENDENCE; SPECTRAL RANGE; VUV EXCITATION;

ANISOTROPY; GERMANIUM; LASER EXCITATION; LASERS; LUMINESCENCE; POLARIZATION; SILICA;

LIGHT;

EID: 66349121608     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2008.11.036     Document Type: Article

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