Growth, structure and friction behavior of titanium doped tungsten disulphide (Ti-WS2) nanocomposite thin films

Thin Solid Films

Volumn 517, Issue 19, 2009, Pages 5666-5675

  Scharf, T W ^a   Rajendran, A ^a   Banerjee, R ^a   Sequeda, F ^a,b  

^a UNIVERSITY OF NORTH TEXAS   (United States)

^b UNIVERSIDAD DEL VALLE   (Colombia)

Author keywords

Cosputtering; Nanocomposites; Physical vapor deposition (PVD); Raman scattering; Scanning electron microscopy; Transmission electron microscopy (TEM); Tribology; X ray diffraction

Indexed keywords

ATOMIC PERCENT; BASAL PLANES; COSPUTTERING; CROSS-SECTIONAL SCANNING; CRYSTALLINITY; FRICTION BEHAVIOR; FRICTION COEFFICIENTS; FRICTION TEST; HIGH TEMPERATURE; IN-SITU; NANOCOMPOSITE SOLIDS; NANOCOMPOSITE THIN FILMS; NANOCRYSTALLINE; ROOM TEMPERATURE; SOLID LUBRICATION; SPUTTERING POWER; SUB-SURFACE; SUBSTRATE SURFACE; SUBSTRATE TEMPERATURE; THERMAL OXIDATION; THIN-FILM STRUCTURE; THIRD BODY; TI DOPED; TITANIUM DOPED; TRANSFER FILM; TRIBOOXIDATION; TUNGSTEN DISULPHIDE; WEAR MAPS; WEAR TRACKS; WELL-DISPERSED; XRD;

CRYSTALLINE MATERIALS; DIAMOND LIKE CARBON FILMS; DIFFRACTION; ELECTRON MICROSCOPES; ELECTRONS; FOCUSED ION BEAMS; FRICTION; NANOCOMPOSITES; OXIDATION; PHYSICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING; SCANNING ELECTRON MICROSCOPY; SHEAR STRENGTH; SOLID LUBRICANTS; SPECTRUM ANALYSIS; SUBSTRATES; TEXTURES; THIN FILM DEVICES; THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; TRIBOLOGY; TUNGSTEN; VAPORS; WEAR OF MATERIALS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

FILM PREPARATION;

EID: 66049106318     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.103     Document Type: Article

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