Characterization of HNA etchant for silicon microneedles array fabrication

IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE

Volumn , Issue , 2008, Pages 203-206

  Aziz, Norazreen Abd ^a   Bais, Badariah ^a   Hamzah, Azrul Azlan ^a   Majlis, Burhanuddin Yeop ^a  

^a INSTITUTE OF MICROENGINEERING AND NANOELECTRONICS IMEN   (Malaysia)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAY FABRICATION; ETCH RATES; ETCHING PROPERTIES; HYPODERMIC NEEDLES; ISOTROPIC ETCHING; MICRONEEDLES; PROCESS CHARACTERIZATION; SILICON MICRONEEDLES; SURFACE PROFILES; TISSUE DAMAGE;

WET ETCHING;

EID: 65949103190     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMELEC.2008.4770308     Document Type: Conference Paper

References (9)

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