Polymer dissolution model: An energy adaptation of the critical ionization theory

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Chauhan, Siddharth ^a   Somervell, Mark ^b   Scheer, Steven ^b   Mack, Chris ^c   Bonnecaze, Roger T ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

^b TOKYO ELECTRON AMERICA INC   (United States)

^c Lithogurucom   (United States)

Author keywords

Critical ionization model; Mesoscale modeling; Photoresist dissolution

Indexed keywords

CRITICAL IONIZATION MODEL; CURRENT MODELS; DEVELOPER CONCENTRATION; DISSOLUTION RATES; DYNAMIC MONTE CARLO METHOD; ELECTRIC DOUBLE LAYER; FAVORABLE INTERACTIONS; INTERACTION ENERGIES; INTERACTION PARAMETERS; LINE EDGE ROUGHNESS; MESOSCALE MODELING; METROPOLIS ALGORITHMS; MICROELECTRONICS INDUSTRY; MOLECULAR LEVEL INTERACTIONS; MOLECULAR LEVELS; POLYMER DISSOLUTION; POLYMER MOLECULAR WEIGHT; SIMULATION RESULT; SURFACE IONIZATION;

IONIZATION; MICROELECTRONICS; MONTE CARLO METHODS; PHOTORESISTORS; PHOTORESISTS; POLYMERS; ROUGHNESS MEASUREMENT; SURFACE TREATMENT; THREE DIMENSIONAL;

DISSOLUTION;

EID: 65849343628     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814344     Document Type: Conference Paper

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