Spectroscopic ellipsometry study of thin film thermo-optical properties

Thin Solid Films

Volumn 517, Issue 17, 2009, Pages 5066-5069

  Xie, H ^a   Ng, F L ^a   Zeng, X T ^a  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Annealing; Ellipsometry; Optical properties; Optical thin films; Titanium oxide

Indexed keywords

CROSS SECTIONAL ANALYSIS; DATA ANALYSIS; ELLIPSOMETER; ELLIPSOMETRIC ANALYSIS; FILM STRUCTURE; HOT STAGE; IN-SITU MONITORING; OPTICAL THIN FILMS; POST DEPOSITION ANNEALING; POST-DEPOSITION; SEM; TEST TEMPERATURES; THERMO-OPTIC COEFFICIENTS; THERMO-OPTICAL PROPERTIES; TIO; TITANIUM OXIDE THIN FILMS;

ANNEALING; LIGHT REFRACTION; OXIDE FILMS; REFRACTIVE INDEX; REFRACTOMETERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; TITANIUM; TITANIUM OXIDES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OPTICAL FILMS;

EID: 65649133629     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.03.159     Document Type: Article

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