Erratum to "Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1 1 1)-7×7 films" [J. Magn. Magn. Mater. 321 (2009) 2398-2401] (DOI:10.1016/j.jmmm.2009.02.127);Effect of oxygen exposure on the magnetic properties of ultrathin Co/Si(1 1 1)-7×7 films

Journal of Magnetism and Magnetic Materials

Volumn 321, Issue 16, 2009, Pages 2398-2401

  Chang, H W ^a   Tsay, J S ^c   Chang, W Y ^c   Huang, K T ^b   Yao, Y D ^d  

^a TUNGHAI UNIVERSITY   (Taiwan)

^b INSTITUTE OF PHYSICS   (Taiwan)

^c NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

^d TATUNG UNIVERSITY   (Taiwan)

Author keywords

Oxygen exposure; Surface magneto optic Kerr effect; Ultrathin Co films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL SHIFT; COBALT COMPOUNDS; COERCIVE FORCE; DEPTH PROFILING; ELECTRONIC DENSITY OF STATES; GAS ADSORPTION; INTERFACES (MATERIALS); MAGNETISM; METALLIC FILMS; OXYGEN; SILICON COMPOUNDS;

AUGER ELECTRON SPECTROSCOPIES (AES); MAGNETO-OPTIC KERR EFFECT; OXYGEN ADSORPTION; OXYGEN EXPOSURE; PROFILING MEASUREMENTS; STRESS ANISOTROPY; ULTRATHIN CO FILMS; VACUUM ENVIRONMENT;

ULTRATHIN FILMS;

EID: 65549146704     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2009.08.010     Document Type: Erratum

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