Modeling of the plasma electrode bias in the negative ion sources with ID PIC method

AIP Conference Proceedings

Volumn 1097, Issue , 2009, Pages 38-46

  Matsushita, D ^a   Kuppef, S ^a   Hatayama, A ^a   Fukano, A ^b   Bacal, M ^c  

^a KEIO UNIVERSITY   (Japan)

^b TOKYO METROPOLITAN COLLEGE OF INDUSTRIAL TECHNOLOGY   (Japan)

^c ECOLE POLYTECHNIQUE   (France)

Author keywords

Negative ion source; Particle in cell modeling; Pe bias

Indexed keywords

EID: 65349136385     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3112536     Document Type: Conference Paper

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