Crystal structure as an origin of high-anisotropy field of FeCoB films with Ru underlayer

IEEE Transactions on Magnetics

Volumn 44, Issue 11 PART 2, 2008, Pages 3899-3901

  Hashimoto, A ^a   Hirata, K ^a   Matsuu, T ^a   Saito, S ^b   Nakagawa, S ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Crystalline texture; FeCoB; High anisotropy field; Ru; Stress induced magnetic anisotropy

Indexed keywords

BINARY ALLOYS; CRYSTAL ORIENTATION; FILM PREPARATION; IRON ALLOYS; MAGNETIC ANISOTROPY; MAGNETISM; RUTHENIUM; TEXTURES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINE TEXTURE; FACING TARGETS SPUTTERING; FECOB; HIGH ANISOTROPY; HIGH MAGNETIC ANISOTROPY; MAGNETOSTRICTION EFFECTS; PREFERRED ORIENTATIONS; STRESS-INDUCED;

COBALT ALLOYS;

EID: 65249183004     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2008.2002252     Document Type: Article

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