Altering infrared metamaterial performance through metal resonance damping

Journal of Applied Physics

Volumn 105, Issue 7, 2009, Pages

  Ginn, J ^a   Shelton, D ^a   Krenz, P ^a   Lail, B ^b   Boreman, G ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b Florida Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CIRCUIT MODELS; COMPLEX FILMS; DC CONDUCTIVITIES; ELECTROMAGNETIC MODELS; EQUIVALENT-CIRCUIT MODELS; MATERIAL PROPERTIES; MEASURED RESULTS; METAMATERIAL; NOBLE METALS; RELAXATION TIME; RESONANCE DAMPING; RESONANCE FREQUENCIES; THIN-FILM RESISTORS;

CIRCUIT THEORY; DAMPING; INFRARED SPECTROSCOPY; METALS; METAMATERIALS; NATURAL FREQUENCIES; RELAXATION PROCESSES; TELECOMMUNICATION SYSTEMS; TUNING;

PRECIOUS METALS;

EID: 65249123399     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3093698     Document Type: Article

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