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Volumn 53, Issue 4, 2008, Pages 155-160

Thick zinc electrodeposition on copper substrate for cyclotron production of 64Cu

Author keywords

Cu 64; Cyclotron isotope; Production; Zinc electrodeposition; Zinc 68 target

Indexed keywords


EID: 65149089835     PISSN: 00295922     EISSN: 15085791     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (5)

References (15)
  • 2
  • 12
    • 11144320824 scopus 로고    scopus 로고
    • A thick rhodium electrodeposition on copper backing as the target for production of palladium-103
    • Sadeghi M, Van den Winkel P, Afarideh H, Haji-Saeid M (2004) A thick rhodium electrodeposition on copper backing as the target for production of palladium-103. J Radioanal Nucl Chem 262;3:665-672
    • (2004) J Radioanal Nucl Chem , vol.262 , Issue.3 , pp. 665-672
    • Sadeghi, M.1    Van den Winkel, P.2    Afarideh, H.3    Haji-Saeid, M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.