Thick rhodium electrodeposition on copper backing as the target for production of palladium-103

Journal of Radioanalytical and Nuclear Chemistry

Volumn 262, Issue 3, 2004, Pages 665-672

  Sadeghi, M ^a   Van Den Winkel, P ^b   Afarideh, H ^a   Haji Saeid, M ^a  

^a Cyclotron Department   (Iran)

^b VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; HYDROCHLORIC ACID; PALLADIUM 103; RHODIUM; SULFATE;

ARTICLE; DENSITY; ELECTRIC CURRENT; IRRADIATION; PH; TEMPERATURE;

EID: 11144320824     PISSN: 02365731     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10967-004-0490-y     Document Type: Article

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