Structural phase transition of ultra thin PrO2 films on Si(111)

Journal of Physics Condensed Matter

Volumn 21, Issue 17, 2009, Pages

  Gevers, S ^a   Weisemoeller, T ^a   Zimmermann, B ^a   Bertram, F ^a   Deiter, C ^a,b   Wollschlager J ^a  

^a UNIVERSITY OF OSNABRÜCK   (Germany)

^b DESY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING PROCESS; ATOMIC DIFFUSIONS; FILM STRUCTURES; HETEROEPITAXIAL; MODEL CATALYSTS; OXYGEN MOBILITIES; ROOM TEMPERATURES; SI (1 1 1); SPA-LEED; SPOT PROFILE ANALYSIS; STRAIN EFFECTS; STRUCTURAL PHASE TRANSITIONS; STRUCTURAL STABILITIES; SURFACE SCIENCE; X-RAY DIFFRACTIONS; X-RAY REFLECTOMETRY;

ANNEALING; ELECTRON DIFFRACTION; OXIDE FILMS; OXYGEN; PHASE INTERFACES; SILICATES; ULTRAHIGH VACUUM; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

PHASE STABILITY;

EID: 65149089259     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/21/17/175408     Document Type: Article

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