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Volumn , Issue , 2009, Pages 409-415

Three-dimensional integration technology and integrated systems

Author keywords

[No Author keywords available]

Indexed keywords

3-D INTEGRATIONS; ARTIFICIAL RETINA CHIPS; CHIP INTEGRATIONS; INTEGRATED SYSTEMS; INTEGRATION TECHNOLOGIES; MICROPROCESSOR TESTS; MULTI CHIPS; PARALLEL IMAGE PROCESSING; RE-CONFIGURABLE; SELF-ASSEMBLY TECHNIQUES; SHARED MEMORIES; THREE-DIMENSIONAL INTEGRATIONS; THROUGH SILICON VIAS; WAFER-TO-WAFER BONDINGS;

EID: 64549097598     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASPDAC.2009.4796515     Document Type: Conference Paper
Times cited : (34)

References (9)
  • 3
    • 0041610704 scopus 로고
    • Three-dimensional integration technology based on wafer bonding technique using micro-bumps
    • T. Matsumoto, and M. Koyanagi et al., "Three-dimensional integration technology based on wafer bonding technique using micro-bumps," Int. Conf. on Solid State Devices and Materials, pp.1073- 1074, 1995.
    • (1995) Int. Conf. on Solid State Devices and Materials , pp. 1073-1074
    • Matsumoto, T.1    Koyanagi, M.2
  • 4
    • 0005641218 scopus 로고    scopus 로고
    • T. Matsumoto, and M. Koyanagi et al., New three- dimensional wafer bonding technology using the adhesive injection method, Jpn. J. Appl. Phys., 1 (3B), pp.1217- 1221, 1998.
    • T. Matsumoto, and M. Koyanagi et al., "New three- dimensional wafer bonding technology using the adhesive injection method," Jpn. J. Appl. Phys., 1 (3B), pp.1217- 1221, 1998.
  • 5
    • 0032116366 scopus 로고    scopus 로고
    • Future system-on-silicon LSI chips
    • M. Koyanagi et al., "Future system-on-silicon LSI chips," IEEE MICRO, 18 (4), pp.17 - 22, 1998.
    • (1998) IEEE MICRO , vol.18 , Issue.4 , pp. 17-22
    • Koyanagi, M.1
  • 7
    • 33750592887 scopus 로고    scopus 로고
    • Three-Dimensional Integration Technology Based on Wafer Bonding with Vertical Buried Interconnections
    • M. Koyanagi et al., "Three-Dimensional Integration Technology Based on Wafer Bonding with Vertical Buried Interconnections," IEEE Trans. Electron Devices, Vol.53, No.11, pp.2799-2808, 2006.
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.11 , pp. 2799-2808
    • Koyanagi, M.1
  • 8
    • 50949092269 scopus 로고    scopus 로고
    • Sub- Atmospheric Chemical Vapor Deposition Process for Chip-to-Wafer 3-Dimensional Integration
    • H. Kikuchi, and Mitsumasa Koyanagi et al., "Sub- Atmospheric Chemical Vapor Deposition Process for Chip-to-Wafer 3-Dimensional Integration,". Int. Conf. on Solid State Devices and Materials, pp.490-491, 2006.
    • (2006) Int. Conf. on Solid State Devices and Materials , pp. 490-491
    • Kikuchi, H.1    Koyanagi, M.2
  • 9
    • 33646909559 scopus 로고    scopus 로고
    • New Three-Dimensional Integration Technology Using Self- Assembly Technique
    • T. Fukushima, and M. Koyanagi et al., "New Three-Dimensional Integration Technology Using Self- Assembly Technique," IEDM, pp.359-362, 2005.
    • (2005) IEDM , pp. 359-362
    • Fukushima, T.1    Koyanagi, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.