SCOPUS 정보 검색 플랫폼

Volumn 27, Issue 2, 2009, Pages 581-584

Improved etch resistance of ZEP 520A in reactive ion etching through heat and ultraviolet light treatment

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-BEAM RESISTS; ETCH RESISTANCES; HARD MASKS; LIFT-OFF PROCESS; PATTERN TRANSFERS; REACTIVE IONS; TREATMENT PROCESS; ULTRA-VIOLET LIGHTS;

ELECTRON BEAMS; HEAT RESISTANCE; INFRARED SPECTROSCOPY; PLASMA ETCHING; PLASMAS; SPECTROSCOPIC ANALYSIS; ULTRAVIOLET RADIATION;

REACTIVE ION ETCHING;

EID: 64549090105 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.3086721 Document Type: Article

Times cited : (9)

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