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Volumn 517, Issue 12, 2009, Pages 3476-3480
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Hot wire CVD deposition of nanocrystalline silicon solar cells on rough substrates
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Author keywords
Hot wire chemical vapour deposition; Nanocrystalline silicon; Rough substrate; Solar cell
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Indexed keywords
AREA RATIOS;
FORMATION MODELS;
HOT WIRE CHEMICAL VAPOUR DEPOSITION;
HOT-WIRE CVD;
LIGHT-TRAPPING;
NC-SI:H;
OPENING ANGLES;
OUTPUT PERFORMANCE;
RMS ROUGHNESS;
ROUGH SUBSTRATE;
SELECTIVE ETCHINGS;
SI ATOMS;
SILICON FILMS;
SILICON NANOCRYSTALS;
SILICON THIN FILMS;
SINGLE JUNCTIONS;
SOLAR CELL PERFORMANCE;
STRAINED-SI;
STRUCTURAL DEFECTS;
SUBSTRATE ROUGHNESS;
SUBSTRATE SURFACES;
TEXTURED SUBSTRATES;
THIN-FILM SILICON SOLAR CELLS;
CELLS;
CHEMICAL VAPOR DEPOSITION;
DIAMOND FILMS;
NANOCRYSTALLINE SILICON;
NONMETALS;
PHOTOVOLTAIC CELLS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON SOLAR CELLS;
SOLAR CELLS;
SURFACE DEFECTS;
THIN FILM DEVICES;
THIN FILMS;
WIRE;
SUBSTRATES;
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EID: 64349112559
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.01.078 Document Type: Article |
Times cited : (9)
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References (9)
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