A hot-wire chemical vapor deposition (HWCVD) method for metal oxide and their alloy nanowire arrays

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3600-3605

  Thangala, J ^a   Vaddiraju, S ^a   Malhotra, S ^a   Chakrapani, V ^a   Sunkara, M K ^a  

^a University of Louisville   (United States)

Author keywords

Doping and absorption spectroscopy; Metal oxides; Molybdenum oxide; Nanotubes; Nanowires; Nucleation and growth mechanisms; Tungsten oxide; Vapor solid (VS) methods

Indexed keywords

DOPING AND ABSORPTION SPECTROSCOPY; METAL OXIDES; MOLYBDENUM OXIDE; NUCLEATION AND GROWTH MECHANISMS; TUNGSTEN OXIDE; VAPOR-SOLID (VS) METHODS;

ABSORPTION; CHEMICAL VAPOR DEPOSITION; ELECTRIC WIRE; FILAMENTS (LAMP); MAGNESIUM; MOLYBDENUM; MOLYBDENUM COMPOUNDS; NANOTUBES; NANOWIRES; NUCLEATION; OXIDES; OXYGEN; SUBSTRATES; SYNTHESIS (CHEMICAL); TRANSITION METAL ALLOYS; TRANSITION METAL COMPOUNDS; TRANSITION METALS; TUNGSTEN; TUNGSTEN COMPOUNDS; VAPORS;

ABSORPTION SPECTROSCOPY;

EID: 64349092850     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.051     Document Type: Article

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