SCOPUS 정보 검색 플랫폼

Materials Science Forum

Volumn 609, Issue , 2009, Pages 117-121

Deposition of titanium nitride thin films onto silicon by RF reactive magnetron sputtering

(3) Saoula, N a Henda, K a Kesri, R b

a CENTRE DE DÉVELOPPEMENT DES TECHNOLOGIES AVANCÉES (Algeria)

b UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE (Algeria)

Author keywords

Magnetron; RF sputtering; Thin films; TiN

Indexed keywords

ATOMIC FORCE MICROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; GAS MIXTURES; MAGNETRON SPUTTERING; METALLIC FILMS; SILICON; TITANIUM NITRIDE;

GASES MIXTURE; MAGNETRA; MAGNETRON-SPUTTERING; PROPERTY; RF REACTIVE MAGNETRON SPUTTERING; RF SPUTTERING; THIN-FILMS; TIN; TIN FILMS; TITANIUM NITRIDE THIN FILMS;

THIN FILMS;

EID: 64349092592 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.609.117 Document Type: Conference Paper

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.