Continuous hot-wire chemical vapor deposition on moving glass substrates

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3588-3590

  Bink, A ^a   Brinza, M ^a   Jongen, J P H ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Amorphous and microcrystalline silicon; Continuous in line deposition; Device quality; Hot wire CVD

Indexed keywords

AMORPHOUS AND MICROCRYSTALLINE SILICON; CONTINUOUS IN-LINE DEPOSITION; DECOMPOSITION MECHANISMS; DEVICE QUALITY; DUST PARTICLES; GAS-PHASE; GLASS SUBSTRATES; HOMOGENEOUS DEPOSITIONS; HOT WIRE CVD; HOT-WIRE CHEMICAL VAPOR DEPOSITIONS; I LAYERS; INSULATING SUBSTRATES; MANUFACTURING SYSTEMS; MICROCRYSTALLINE SILICON THIN FILMS; PLASMA-ENHANCED CVD;

AMORPHOUS FILMS; AMORPHOUS SILICON; DECOMPOSITION; DEPOSITION; GLASS; MICROCRYSTALLINE SILICON; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; VAPORS; WIRE;

SUBSTRATES;

EID: 64349086193     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.068     Document Type: Article

References (2)

1. Matsumura H., and Ohdaira K. Thin Solid Films 516 (2008) 537
2. Li H., Franken R.H., Stolk R.L., van der Werf C.H.M., Rath J.K., and Schropp R.E.I. Thin Solid Films 516 (2008) 755