Growth of long aligned carbon nanotubes on amorphous hydrogenated silicon nitride by thermal chemical vapor deposition

Materials Letters

Volumn 63, Issue 15, 2009, Pages 1249-1251

  Handuja, Sangeeta ^a   Singh, Sarab Preet ^a   Srivastava, P ^a   Vankar, V D ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Carbon nanotubes; Chemical vapor deposition; Silicon nitride

Indexed keywords

ACTIVE SITES; ALIGNED CARBON NANOTUBES; AMORPHOUS SILICON NITRIDES; CATALYST LIVES; CRYSTALLINE SILICONS; FERROCENE; H CLUSTERS; HIGH-TEMPERATURE ANNEALING; HYDROGENATED SILICONS; MATRIXES; MECHANICAL SUPPORTS; OUT DIFFUSIONS; OXYGEN AMBIENT; SILICIDE FORMATIONS; SILICON DIOXIDES; SILICON SUBSTRATES; THERMAL CHEMICAL VAPOR DEPOSITIONS; THIN LAYERS; VERTICALLY ALIGNED;

AMORPHOUS CARBON; AMORPHOUS SILICON; AROMATIC HYDROCARBONS; CARBON CLUSTERS; CARBON NITRIDE; CATALYSIS; CATALYSTS; CHEMICAL VAPOR DEPOSITION; HYDROGEN; HYDROGENATION; IRON COMPOUNDS; OXYGEN; SILICA; SILICIDES; SILICON NITRIDE; VAPORS; XYLENE;

CARBON NANOTUBES;

EID: 64049107078     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2009.02.050     Document Type: Article

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