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Volumn 203, Issue 16, 2009, Pages 2333-2336

Improvement of physical properties of Cu-infiltrated W compacts via electroless nickel plating of primary tungsten powder

Author keywords

Electroless nickel plating; Infiltration; Relative density; Tungsten copper composite

Indexed keywords

CONSTANT PRESSURES; CYLINDRICAL SHAPES; ELECTRICAL CONDUCTIVITIES; ELECTROLESS NICKEL PLATING; ELECTROLESS NICKELS; HYDROGEN ATMOSPHERES; LIQUID COPPERS; MICROSTRUCTURAL OBSERVATIONS; RELATIVE DENSITY; SEM; SPECIFIC RESISTIVITIES; TUNGSTEN POWDERS; TUNGSTEN-COPPER COMPOSITE; XRD;

EID: 63749130361     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.02.055     Document Type: Article
Times cited : (52)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.