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Volumn 203, Issue 16, 2009, Pages 2333-2336
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Improvement of physical properties of Cu-infiltrated W compacts via electroless nickel plating of primary tungsten powder
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Author keywords
Electroless nickel plating; Infiltration; Relative density; Tungsten copper composite
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Indexed keywords
CONSTANT PRESSURES;
CYLINDRICAL SHAPES;
ELECTRICAL CONDUCTIVITIES;
ELECTROLESS NICKEL PLATING;
ELECTROLESS NICKELS;
HYDROGEN ATMOSPHERES;
LIQUID COPPERS;
MICROSTRUCTURAL OBSERVATIONS;
RELATIVE DENSITY;
SEM;
SPECIFIC RESISTIVITIES;
TUNGSTEN POWDERS;
TUNGSTEN-COPPER COMPOSITE;
XRD;
COPPER;
ELECTRIC CONDUCTIVITY;
ELECTROLESS PLATING;
HYDROGEN;
NICKEL;
NICKEL ALLOYS;
NICKEL PLATING;
OPTICAL MICROSCOPY;
PHOSPHORUS;
POWDERS;
SCANNING ELECTRON MICROSCOPY;
SEEPAGE;
SOIL MECHANICS;
TUNGSTEN;
TUNGSTEN ALLOYS;
TUNGSTEN COMPOUNDS;
TUNGSTEN POWDER METALLURGY;
TUNGSTEN PLATING;
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EID: 63749130361
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.02.055 Document Type: Article |
Times cited : (52)
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References (25)
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