A novel β-FeSi2 thin film solar cell fabricated by sputtering

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn A, Issue , 2003, Pages 126-129

  Liu, Zhengxin ^a,b   Wang, Shinan ^a   Otogawa, Naotaka ^a,b   Osamura, Masato ^a,b   Ootsuka, Teruhisa ^a,b   Mise, Takahiro ^a,b   Suzuki, Yasuhito ^a   Fukuzawa, Yasuhiio ^a,b   Nakayama, Yasuhiko ^a,b   Tanoue, Hisao ^a   Makita, Yunosuke ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b System Engineers' Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR MASS (AM); BAND GAP; FACING-TARGET SPUTTERING (FTS); ION BEAM SYNTHESIS (IBS);

CARRIER MOBILITY; CURRENT DENSITY; ELECTRIC POTENTIAL; EPITAXIAL GROWTH; HETEROJUNCTIONS; INTERFACES (MATERIALS); ION IMPLANTATION; LIGHTING; NETWORKS (CIRCUITS); OPTIMIZATION; SHORT CIRCUIT CURRENTS; SINGLE CRYSTALS; SOLAR CELLS; SPUTTERING;

THIN FILMS;

EID: 6344270094     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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