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Volumn B, Issue , 2003, Pages 1356-1359

Application of screen printing processes for epitaxial silicon thin-film solar cells

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL MATERIALS; NON-COMMERCIAL REACTOR; SHORT-CIRCUIT CURRENTS; THIN FILM SOLAR CELLS;

EID: 0346841347     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (13)
  • 3
  • 7
    • 0036778148 scopus 로고    scopus 로고
    • Thin film silicon solar cells on upgraded metallurgical silicon substrates prepared by liquid phase epitaxy
    • K. Peter, R. Kopecek, P. Fath, E. Bucher, C. Zahedi, "Thin film silicon solar cells on upgraded metallurgical silicon substrates prepared by liquid phase epitaxy", Solar Energy Materials & Solar Cells 74 (2002) 219-223.
    • (2002) Solar Energy Materials & Solar Cells , vol.74 , pp. 219-223
    • Peter, K.1    Kopecek, R.2    Fath, P.3    Bucher, E.4    Zahedi, C.5
  • 10
    • 0033312603 scopus 로고    scopus 로고
    • High-temperature CVD for crystalline-silicon thin-film solar cells
    • F.R. Faller, A. Hurrle, "High-Temperature CVD for Crystalline-Silicon Thin-Film Solar Cells", IEEE Transaction on Electron Devices Vol. 46:10 (1999) 2048-2054.
    • (1999) IEEE Transaction on Electron Devices , vol.46 , Issue.10 , pp. 2048-2054
    • Faller, F.R.1    Hurrle, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.