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Volumn B, Issue , 2003, Pages 1475-1478

The challenge to implement thin wafer potential with wire saw cutting technology

Author keywords

[No Author keywords available]

Indexed keywords

FREE-ABRASIVE SLICING TECHNOLOGY; MULTI-WIRE SLURRY SAW (MWS); TOTAL THICKNESS VARIATION (TTV); WAFER LOSS;

EID: 6344253229     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (11)

References (9)
  • 1
    • 0008504101 scopus 로고    scopus 로고
    • February, March, April 2002-10-14
    • P. D. Maycock, PV News, February 2000, March 2001, April 2002-10-14
    • (2000) PV News
    • Maycock, P.D.1
  • 7
    • 0036747422 scopus 로고    scopus 로고
    • Automated handling of ultra-thin silicon wafers
    • September
    • F.A. Tony Schraub, "Automated Handling of Ultra-Thin Silicon Wafers", Solid State Technology, September 2002
    • (2002) Solid State Technology
    • Schraub, F.A.T.1
  • 8
    • 84861191929 scopus 로고    scopus 로고
    • Advanced slicing techniques for single crystals
    • Eds. H. J. Scheel and T. Fukuda, (Wiley), in press
    • C. Hauser and P. M. Nasch, "Advanced Slicing Techniques for Single Crystals", in Crystal Growth Technology, Eds. H. J. Scheel and T. Fukuda, (Wiley), in press.
    • Crystal Growth Technology
    • Hauser, C.1    Nasch, P.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.