Formation of β-FeSi2 microstructures by reactive Ion etching using SF6 gas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 A, 2004, Pages 5245-5246

  Wang, Shinan ^a   Liu, Zhengxin ^b   Fukuzawa, Yasuhiro ^a   Osamura, Masato ^b   Ootsuka, Teruhisa ^b   Suzuki, Yasuhito ^b   Otogawa, Naotaka ^a   Nakayama, Yasuhiko ^a   Tanoue, Hisao ^a   Makita, Yunosuke ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b System Engineers Co Ltd   (Japan)

Author keywords

FeSi2; Microstructure; Reactive ion etching; Sf6 gas

Indexed keywords

ALUMINUM; GASES; IRON COMPOUNDS; MASKS; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SULFUR COMPOUNDS; THERMAL EFFECTS;

CHEMICAL ETCHING; ETCH RATE; ETCHING MASKS; SF6 GAS;

MICROSTRUCTURE;

EID: 6344253084     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5245     Document Type: Article

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