Amorphous silicon solar cells at high deposition rates using newly developed PECVD

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1733-1736

  Komoda, M ^a   Niira, K ^a   Senta, H ^a   Nishimura, T ^a   Hakuma, H ^a   Okui, H ^a   Aramaki, K ^a   Okada, Y ^a   Tomita, K ^a   Higuchi, H ^a   Arimune, H ^a  

^a KYOCERA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON SOLAR CELLS; CONVERSION EFFICIENCY; DEPOSITION RATES; PHOTO-STABILITY;

CATALYSIS; GROWTH (MATERIALS); HETEROJUNCTIONS; HYDROGEN; PARAMAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM EFFICIENCY; RAMAN SPECTROSCOPY; SOLAR CELLS;

AMORPHOUS SILICON;

EID: 6344231798     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. N. Nakamura et al., Jpn. J. Appl. Phys. 28, 1762 (1989).
2. T. Itoh et al, Thin Solid Films 395, 217 (2001)
3. J. S. Lannin, Physics Today 28. (1988).
4. th. Proc. 745 (2001).