Large temperature coefficient of resistance in La0.7Ca 0.3MnO3 thin films obtained by metal organic deposition process

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 8 B, 2004, Pages

  Daoudi, Kais ^a   Tsuchiya, Tetsuo ^a   Mizuta, Susumu ^a   Yamaguchi, Iwao ^a   Manabe, Takaaki ^a   Kumagai, Toshiya ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Epitaxial growth; LCMO; MOD; TCR; Thin films

Indexed keywords

ANNEALING; COLOSSAL MAGNETORESISTANCE; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; MANGANESE COMPOUNDS; PEROVSKITE; PULSED LASER DEPOSITION; SINTERING; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

ANNEALING TEMPERATURE; LCMO; METAL-ORGANIC DEPOSITION (MOD); TEMPERATURE COEFFICIENT OF RESISTANCE (TCR);

LANTHANUM;

EID: 6344229846     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.L1054     Document Type: Article

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