Bond strength of a pit-and-fissure sealant associated to etch-and-rinse and self-etching adhesive systems to saliva-contaminated enamel: Individual vs. simultaneous light curing

Brazilian Dental Journal

Volumn 19, Issue 4, 2008, Pages 341-347

  Gomes Silva, Jaciara Miranda ^a   Torres, Carolina Paes ^a   Contente, Marta Maria Martins Giamatei ^a   Oliveira, Maria Angélica Hueb de Menezes ^b   Palma Dibb, Regina Guenka ^a   Borsatto, Maria Cristina ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b UNIVERSITY OF UBERABA   (Brazil)

Author keywords

Adhesive system; Light curing; Pit and fissure sealant; Salivary contamination; Shear bond strength

Indexed keywords

BISPHENOL A BIS(2 HYDROXYPROPYL) ETHER DIMETHACRYLATE; DENTIN BONDING AGENT; FISSURE SEALANT; FLUOROSHIELD; POLYURETHAN; RESIN CEMENT;

ARTICLE; COMPARATIVE STUDY; DENTAL BONDING; DENTAL CARE; DENTAL ETCHING; DENTAL PELLICLE; DENTAL SURGERY; ENAMEL; EVALUATION; HUMAN; MATERIALS TESTING; METHODOLOGY; MOLAR TOOTH; SALIVA; SHEAR STRENGTH; TIME;

BISPHENOL A-GLYCIDYL METHACRYLATE; DENTAL BONDING, LIGHT-CURED; DENTAL ENAMEL; DENTAL ETCHING; DENTAL PELLICLE; DENTAL RESTORATION FAILURE; DENTAL STRESS ANALYSIS; DENTIN-BONDING AGENTS; HUMANS; MATERIALS TESTING; MOLAR; PIT AND FISSURE SEALANTS; POLYURETHANES; RESIN CEMENTS; SALIVA; SHEAR STRENGTH; TIME FACTORS;

EID: 63249112427     PISSN: 01036440     EISSN: 18064760     Source Type: Journal    
DOI: 10.1590/s0103-64402008000400010     Document Type: Article

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