Effects of Ion Bombardment during a-Si based Film Growth in Plasma CVD

IEEJ Transactions on Fundamentals and Materials

Volumn 124, Issue 9, 2004, Pages 837-843

  Fujikake, Shinji ^a   Takano, Akihiro ^a   Kamoshita, Tomoyoshi ^a  

^a FUJI ELECTRIC CO   (Japan)

Author keywords

a Si; a SiGe; ion bombardment; plasma CVD

Indexed keywords

EID: 62949143944     PISSN: 03854205     EISSN: 13475533     Source Type: Journal    
DOI: 10.1541/ieejfms.124.837     Document Type: Article

References (10)

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