Photo-induced superhydrophilic TiO2 films deposited by DC reactive magnetron sputtering at room temperature

Advanced Materials Research

Volumn 55-57, Issue , 2008, Pages 441-444

  Horprathum, M ^a,b   Chindaudom, P ^a   Patthanasettakul, V ^a   Rotbuathong, S ^b   Eiamchai, P ^b   Limsuwan, P ^b  

^a NATIONAL ELECTRONICS AND COMPUTER TECHNOLOGY CENTER   (Thailand)

^b KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI   (Thailand)

Author keywords

Dc reactive magnetron sputtering; Optical properties; Superhydrophilic; Titanium dioxide

Indexed keywords

AFM; ATOMIC-FORCE MICROSCOPIES; CONTACT-ANGLE MEASUREMENTS; CONTROL GATES; DC REACTIVE MAGNETRON SPUTTERING; DC SPUTTERING; FIELD EMISSION-SCANNING ELECTRON MICROSCOPIES; FILM STRUCTURES; GLASS SLIDES; HYDROPHILIC PROPERTIES; OPERATING PRESSURES; PHOTO-INDUCED; ROOM TEMPERATURES; RUTILE PHASE; SPUTTERING PRESSURES; STRUCTURAL AND OPTICAL PROPERTIES; SUPERHYDROPHILIC; UV LIGHTS; X-RAY DIFFRACTIONS; XRD;

ANGLE MEASUREMENT; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; CRYSTAL ATOMIC STRUCTURE; ELECTRODEPOSITION; FIELD EMISSION; HYDROPHILICITY; INTELLIGENT MATERIALS; LIGHT; MAGNETRONS; NANOSTRUCTURED MATERIALS; OPTICAL CONSTANTS; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTROSCOPIC ELLIPSOMETRY; SPONTANEOUS EMISSION; SURFACE ROUGHNESS; SURFACE STRUCTURE; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

FUNCTIONAL MATERIALS;

EID: 62949087265     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

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