Poly(3,4-ethylenedioxythiophene)/poly(4-styrenesulfonate): Correlation between colloidal particles and thin films

Thin Solid Films

Volumn 517, Issue 11, 2009, Pages 3299-3303

  Yan, Hu ^a   Arima, Susumu ^b   Mori, Yusaku ^a   Kagata, Tsubasa ^a   Sato, Hiroshi ^b   Okuzaki, Hidenori ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

Atomic force microscopy (AFM); Polymer; Transmission electron microscopy (TEM); X ray photoelectron spectroscopy (XPS)

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; DYNAMIC LIGHT SCATTERING; DYNAMIC LOADS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPES; ELECTRONS; NANOPARTICLES; ORGANIC POLYMERS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; PLASTIC COATINGS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTRUM ANALYSIS; SPIN DYNAMICS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC FORCE MICROSCOPY (AFM); ATOMIC FORCES; BAYTRON P; COLLOIDAL DISPERSIONS; COLLOIDAL PARTICLES; DLS MEASUREMENTS; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; ETHYLENEDIOXYTHIOPHENE; MEAN DIAMETERS; MINIMUM THICKNESS; PEDOT/PSS; POLIES (4STYRENESULFONATE); PRIMARY NANOPARTICLES; PRIMARY PARTICLES; SCANNING TRANSMISSION ELECTRON MICROSCOPIES; SPIN-COATED THIN FILMS; SPIN-COATING; STEM OBSERVATIONS; STEM-EDX; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); XPS MEASUREMENTS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 62849118253     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.004     Document Type: Article

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