메뉴 건너뛰기




Volumn 17, Issue 6, 2009, Pages 4412-4418

Low threshold monocrystalline Nd:(Gd, Lu)2O3 channel waveguide laser

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA FILLED WAVEGUIDES; PULSED LASER DEPOSITION; PUMPING (LASER); REACTIVE ION ETCHING; WAVEGUIDES;

EID: 62549143483     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.004412     Document Type: Article
Times cited : (22)

References (19)
  • 1
    • 34250746455 scopus 로고    scopus 로고
    • Dielectric Solid-State Planar Waveguide Lasers: A Review
    • J. I. Mackenzie, "Dielectric Solid-State Planar Waveguide Lasers: A Review," IEEE J. Select. Topics Quantum Electron. 13, 626-637 (2007).
    • (2007) IEEE J. Select. Topics Quantum Electron , vol.13 , pp. 626-637
    • Mackenzie, J.I.1
  • 3
    • 48249144414 scopus 로고    scopus 로고
    • Dielectric binary oxide films as waveguide laser media: A review
    • C. Grivas and R. W Eason, "Dielectric binary oxide films as waveguide laser media: a review," J. Phys.: Condens. Matter 20, 264011(2008).
    • (2008) J. Phys.: Condens. Matter , vol.20 , pp. 264011
    • Grivas, C.1    Eason, R.W.2
  • 5
    • 0001771963 scopus 로고
    • Pulsed Laser Deposition (Part I) - A Review of Process Characteristics and Capabilities
    • K. L. Saenger, "Pulsed Laser Deposition (Part I) - A Review of Process Characteristics and Capabilities," Processing of Advanced Materials 2, 1-24 (1993).
    • (1993) Processing of Advanced Materials , vol.2 , pp. 1-24
    • Saenger, K.L.1
  • 6
    • 0002442016 scopus 로고
    • Pulsed Laser Deposition (Part II) - A Review of Process Mechanisms
    • K. L. Saenger, "Pulsed Laser Deposition (Part II) - A Review of Process Mechanisms," Processing of Advanced Materials 3, 63-82 (1993).
    • (1993) Processing of Advanced Materials , vol.3 , pp. 63-82
    • Saenger, K.L.1
  • 7
    • 0031557645 scopus 로고    scopus 로고
    • In situ monitoring during pulsed laser deposition of complex oxides using reflection high energy electron diffraction under high oxygen pressure
    • G. J. H. M. Rijnders, G. Koster, D. H. A. Blank, and H. Rogalla, "In situ monitoring during pulsed laser deposition of complex oxides using reflection high energy electron diffraction under high oxygen pressure," Appl. Phys. Lett. 70, 1888-1890(1997).
    • (1997) Appl. Phys. Lett , vol.70 , pp. 1888-1890
    • Rijnders, G.J.H.M.1    Koster, G.2    Blank, D.H.A.3    Rogalla, H.4
  • 17
    • 39749165221 scopus 로고    scopus 로고
    • Model for the calculation of radiation trapping and description of the pinhole method
    • H. Kühn, S. T. Fredrich-Thornton, C. Kränkel, R. Peters, and K. Petermann, "Model for the calculation of radiation trapping and description of the pinhole method," Opt. Lett. 32, 1908-1910 (2007).
    • (2007) Opt. Lett , vol.32 , pp. 1908-1910
    • Kühn, H.1    Fredrich-Thornton, S.T.2    Kränkel, C.3    Peters, R.4    Petermann, K.5
  • 18
    • 33644980559 scopus 로고    scopus 로고
    • 3+-dotierte Sesquioxide,
    • Ph.D. thesis, Universität Hamburg
    • 3+-dotierte Sesquioxide," Ph.D. thesis, Universität Hamburg (1999).
    • (1999)
    • Fornasiero, L.1
  • 19
    • 0016082602 scopus 로고
    • Emission cross section and fluorescence efficiency of Nd-pentaphosphate
    • H. P. Weber, P. F. Liao, and B. C. Tofield, "Emission cross section and fluorescence efficiency of Nd-pentaphosphate," IEEE J. Quantum Electron. 10, 563-567 (1974).
    • (1974) IEEE J. Quantum Electron , vol.10 , pp. 563-567
    • Weber, H.P.1    Liao, P.F.2    Tofield, B.C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.