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Volumn 111, Issue 5, 2009, Pages 2340-2344
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Spectral, thermal, and photoreactivity studies on epoxy resin containing benzylidene units in the main chain
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Author keywords
Bis(4 hydroxy 3 methoxy benzylidene) acetone; Epoxy content; Photo acid generator; Photoreactivity; Photoresist; UV irradiation
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Indexed keywords
ACETONE;
ACIDS;
DIFFERENTIAL SCANNING CALORIMETRY;
GLASS TRANSITION;
IRRADIATION;
LIGHT SENSITIVE MATERIALS;
NUCLEAR MAGNETIC RESONANCE;
NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY;
PHOTOREACTIVITY;
PHOTORESISTORS;
PHOTOSENSITIVITY;
POLYCONDENSATION;
RESINS;
SURFACE TREATMENT;
THERMODYNAMIC STABILITY;
THERMOGRAVIMETRIC ANALYSIS;
ULTRAVIOLET SPECTROSCOPY;
BIS(4-HYDROXY-3-METHOXY BENZYLIDENE) ACETONE;
EPICHLOROHYDRIN;
EPOXY CONTENT;
GLASS TRANSITION TEMPERATURES;
MAIN CHAINS;
NMR SPECTROSCOPIES;
PHOTO ACID GENERATOR;
PHOTO-CROSS-LINKING;
PHOTOSENSITIVE EPOXIES;
SOLUTION POLYCONDENSATION;
THERMAL STABILITIES;
UV IRRADIATION;
UV SPECTROSCOPIES;
EPOXY RESINS;
COATING;
CONDENSATION;
CROSS LINKING;
EPOXY RESIN;
GLASS TRANSITION TEMPERATURE;
SYNTHESIS;
THERMAL PROPERTY;
THERMOGRAVIMETRY;
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EID: 62349106013
PISSN: 00218995
EISSN: 10974628
Source Type: Journal
DOI: 10.1002/app.29200 Document Type: Article |
Times cited : (20)
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References (15)
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