Adsorption kinetics of NO2 on single-walled carbon nanotube thin-film sensor

Japanese Journal of Applied Physics

Volumn 47, Issue 10 PART 1, 2008, Pages 8145-8147

  Wongwiriyapan, Winadda ^a,b   Inoue, Satoshi ^a,b   Honda, Shin ichi ^a,b   Katayama, Mitsuhiro ^a,b  

^a OSAKA UNIVERSITY   (Japan)

^b KING MONGKUT'S INSTITUTE OF TECHNOLOGY LADKRABANG   (Thailand)

Author keywords

Adsorption energy; Gas sensor; Langmuir adsorption isotherm; Single walled carbon nanotube; Sticking probability

Indexed keywords

ADSORPTION; ADSORPTION ISOTHERMS; FIBER OPTIC SENSORS; GAS DETECTORS; SENSORS; SINGLE-WALLED CARBON NANOTUBES (SWCN); THIN FILM DEVICES; VACUUM;

ADSORPTION ENERGY; ADSORPTION KINETICS; ADSORPTION PROPERTIES; AMBIENT AIRS; DETECTION LIMITS; GAS SENSOR; HIGH SENSITIVITIES; HIGH VACUUMS; IN VACUUMS; LANGMUIR ADSORPTION ISOTHERM; RESIDUAL GAS; STICKING PROBABILITY; THIN-FILM SENSORS;

CARBON NANOTUBES;

EID: 62249179219     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.8145     Document Type: Article

References (20)

1. J. Kong, N. R. Franklin, C. Zhou, M. G. Chapline, S. Peng, K. Cho, and H. Dai: Science 287 (2000) 622.
2. P. Qi, O. Vermesh, M. Grecu, A. Javey, Q. Wang, H. Dai, S. Peng, and K. J. Cho: Nano Lett. 3 (2003) 347.
3. J. Li, Y. Lu, Q. Ye, M. Cinke, J. Han, and M. Meyyappan: Nano Lett. 3 (2003) 929.
4. W. Wongwiriyapan, S. Honda, H. Konishi, T. Mizuta, T. Ikuno, T. Ito, T. Maekawa, K. Suzuki, H. Ishikawa, K. Oura, and M. Katayama: Jpn. J. Appl. Phys. 44 (2005) L482.
5. S. Peng and K. Cho: Nanotechnology 11 (2000) 57.
6. H. Chang, J. D. Lee, S. M. Lee, and Y. H. Lee: Appl. Phys. Lett. 79 (2001) 3863.
7. J. Zhao, A. Buldum, J. Han, and J. P. Lu: Nanotechnology 13 (2002) 195.
8. A. Sadrzadeh, A. A. Farajian, and B. I. Yakobson: Appl. Phys. Lett. 92 (2008) 022103.
9. S. Peng, K. Cho, P. Qi, and H. Dai: Chem. Phys. Lett. 387 (2004) 271.
10. M. D. Ellison, M. J. Crotty, D. Koh, R. L. Spray, and K. E. Tate: J. Phys. Chem. B 108 (2004) 7938.
11. S. Kim, H. R. Lee, Y. J. Yun, S. Ji, K. Yoo, W. S. Yun, J.-Y. Koo, and D. H. Ha: Appl. Phys. Lett. 91 (2007) 093126.
12. W. Kim, A. Javey, O. Vermesh, Q. Wang, Y. Li, and H. Dai: Nano Lett. 3 (2003) 193.
13. V. Derycke, R. Martel, J. Appenzeller, and Ph. Avouris: Nano Lett. 1 (2001) 453.
14. P. G. Collins, K. Bradley, M. Ishigami, and A. Zettl: Science 287 (2000) 1801.
15. W. Wongwiriyapan, S. Honda, H. Konishi, T. Mizuta, T. Ikuno, T. Ohmori, T. Ito, R. Shimazaki, T. Maekawa, K. Suzuki, H. Ishikawa, K. Oura, and M. Katayama: Jpn. J. Appl. Phys. 45 (2006) 3669.
16. P. G. Collins, M. S. Arnold, and Ph. Avouris: Science 292 (2001) 706.
17. G. Attard and C. Barnes: Surfaces (Oxford University Press, New York, 2006).
18. K. Oura, V. G. Lifshits, A. A. Saranin, A. V. Zotov, and M. Katayama: Surface Science - An Introduction (Springer, Berlin, 2003).
19. W. Wongwiriyapan, S. Honda, H. Konishi, T. Mizuta, T. Ohmori, Y. Kishimoto, T. Ito, T. Maekawa, K. Suzuki, H. Ishikawa, T. Murakami, K. Kisoda, H. Harima, K. Oura, and M. Katayama: Nanotechnology 17 (2006) 4424.
20. J. Zhao, A. Buldum, J. Han, and J. P. Lu: Nanotechnology 13 (2002) 195.