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Volumn , Issue 40, 2008, Pages 4983-4985

Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique (Chemical Communications (2008) (4983-4985) DOI: 10.1039/b807428c);Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique

(3) Chen, Ching Shiun a Lin, Jarrn Horng b Lai, Tzn Wen a

a CHANG GUNG UNIVERSITY (Taiwan)

b NATIONAL UNIVERSITY OF TAINAN (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 62249147024 PISSN: 13597345 EISSN: None Source Type: Journal
DOI: 10.1039/b807428c Document Type: Erratum

Times cited : (28)

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