Optical lithography - Thirty years and three orders of magnitude: The evolution of optical lithography tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3050, Issue , 1997, Pages 24-37

  Bruning, John H ^a  

^a Tropel Corporation ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS; PHOTOLITHOGRAPHY; PRINTING; SCANNING;

CONTACT PRINTINGS; LINE-WIDTHS; MASK MAKERS; MIRROR SYSTEMS; OPTICAL LITHOGRAPHIES; PRINTING MODES; SCANNING TECHNIQUES; SHORTER WAVELENGTHS; STEP AND REPEATS; STEP AND SCANS; THREE ORDERS OF MAGNITUDES; WAFER SIZES;

PROCESS CONTROL;

EID: 62249112080     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275920     Document Type: Conference Paper

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