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Volumn 311, Issue 5, 2009, Pages 1430-1434
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Epitaxial growth of high-aspect-ratio TiN nanosheets on Si (1 0 0)
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Author keywords
A1. Growth models; A1. Nanostructures; B1. Nanomaterials; B1. Nitrides
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Indexed keywords
ASPECT RATIO;
NANOSHEETS;
NANOSTRUCTURED MATERIALS;
NITRIDES;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
TIN;
TITANIUM COMPOUNDS;
TITANIUM NITRIDE;
A1. GROWTH MODELS;
A1. NANOSTRUCTURES;
ANISOTROPIC GROWTHS;
B1. NANOMATERIALS;
B1. NITRIDES;
CRYSTALLINE PLANES;
FORMATION MECHANISMS;
GROWTH DIRECTIONS;
HIGH ASPECT RATIOS;
HRTEM IMAGES;
LATTICE STRUCTURES;
SI(1 0 0 );
EPITAXIAL GROWTH;
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EID: 61449143426
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2008.12.022 Document Type: Article |
Times cited : (2)
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References (14)
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