SCOPUS 정보 검색 플랫폼

Volumn 255, Issue 11, 2009, Pages 5917-5921

Photosensitivity of nanocrystalline ZnO films grown by PLD

(10) Ayouchi, R a Bentes, L a Casteleiro, C a Conde, O b Marques, C P c Alves, E c Moutinho, A M C d Marques, H P d Teodoro, O d Schwarz, R a

a INSTITUTO SUPERIOR TÉCNICO (Portugal)

b UNIVERSITY OF LISBON (Portugal)

c INSTITUTO TECNOLÓGICO E NUCLEAR (Portugal)

d UNIVERSIDADE NOVA DE LISBOA (Portugal)

Author keywords

Persistent photoconductivity; Polycrystalline films; Pulsed laser deposition; ZnO thin films

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC FORCE MICROSCOPY; II-VI SEMICONDUCTORS; LASER ABLATION; METALLIC FILMS; NANOCRYSTALS; OPTICAL FILMS; PHOTOCONDUCTIVITY; PULSED LASER DEPOSITION; PULSED LASERS; SAPPHIRE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

C AXIS ORIENTED; LOWER TEMPERATURES; NANOCRYSTALLINE ZNO; OXYGEN DEFICIENT; PERSISTENT PHOTOCONDUCTIVITY; POLYCRYSTALLINE FILM; SUBSTRATE TEMPERATURE; ZNO THIN FILM;

THIN FILMS;

EID: 60949106009 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2009.01.033 Document Type: Article

Times cited : (13)

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