Footing reduction of positive deep-UV photoresists on plasma-enhanced ARL (PE ARL) SiON substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 960-971

  Joesten, Lori A ^a   Moynihan, Matthew L ^a   Lindsay, Tracy K ^a   Reilly, Michael T ^a   Konjuh, Kathy ^b   Mordo, David ^b   MacWilliams, Kenneth P ^b   Sundararajan, Srini ^b  

^a SHIPLEY COMPANY   (United States)

^b NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; BORON NITRIDE; PHOSPHORUS; PHOTORESISTORS; PHOTORESISTS; SILICATES; SILICON NITRIDE; SURFACE TREATMENT; TITANIUM; TITANIUM NITRIDE;

CRITICAL DIMENSIONS; DEEP-UV; NON UNIFORMITIES; PHOSPHOROUS SILICATE GLASS; PHOTO RESIST PROCESSING; POSSIBLE SOLUTIONS; PROFILE DEVIATIONS; SILICON OXYNITRIDE; SUBSTRATE INTERFACES; SUBSTRATE MANIPULATIONS;

SUBSTRATES;

EID: 60849105372     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312354     Document Type: Conference Paper

References (4)

1. Jun-Sung Chun, Cheol-Kyu Bok, and Ki-Ho Baik, "Study on Reduction of Substrate Dependency of Chemically Amplified Resist," Proc. SP1E 2724, p. 94, 1996.
2. C-H Hsia, C-C Hsu, A.Y.S. Chen, D. Srinivas, and K. MacWilliams, "A Novel Inorganic SiON PECVD Anti Reflective Layer (PEARL) for Sub-half Micron Optical Lithography," VMIC Speciality Conference on Dielectrics for ULSI Multilevel interconnect (DUMIC), Santa Clara, CA, February 16-17, 1998.
3. Yoshio Kawai, Akihico Otaka, Akinobu Tanaka, and Tadahito Matsuda, "The Effect of an Organic Base in Chemically Amplified Resist on Patterning Characteristics Using KrF Lithography," J.Appl. Phys. Vol 33, pp7023-7027, 1994.
4. Chris A. Mack, "Lithography on reflective substrates," Microlithography World, pp. 21-22, Spring 1997.