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Volumn 94, Issue 7, 2009, Pages

High minority carrier lifetime in Ga-doped Czochralski-grown silicon by Ge codoping

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; GALLIUM; GERMANIUM; OXYGEN; SILICON;

EID: 60749111867     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3085959     Document Type: Article
Times cited : (11)

References (12)
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  • 6
    • 0014741452 scopus 로고
    • 0003-6951 10.1063/1.1653111.
    • A. J. R. De Kock, Appl. Phys. Lett. 0003-6951 10.1063/1.1653111 16, 100 (1970).
    • (1970) Appl. Phys. Lett. , vol.16 , pp. 100
    • De Kock, A.J.R.1
  • 8
    • 0000727267 scopus 로고
    • 0022-0248 10.1016/0022-0248(82)90386-4.
    • V. V. Voronkov, J. Cryst. Growth 0022-0248 10.1016/0022-0248(82)90386-4 59, 625 (1982).
    • (1982) J. Cryst. Growth , vol.59 , pp. 625
    • Voronkov, V.V.1
  • 9
    • 0032206825 scopus 로고    scopus 로고
    • 0022-0248 10.1016/S0022-0248(98)00550-8.
    • V. V. Voronkov and R. Falster, J. Cryst. Growth 0022-0248 10.1016/S0022-0248(98)00550-8 194, 76 (1998).
    • (1998) J. Cryst. Growth , vol.194 , pp. 76
    • Voronkov, V.V.1    Falster, R.2
  • 11
    • 0035341560 scopus 로고    scopus 로고
    • 0167-9317 10.1016/S0167-9317(00)00521-9.
    • V. V. Voronkov and R. Falster, Microelectron. Eng. 0167-9317 10.1016/S0167-9317(00)00521-9 56, 165 (2001).
    • (2001) Microelectron. Eng. , vol.56 , pp. 165
    • Voronkov, V.V.1    Falster, R.2
  • 12
    • 0000254908 scopus 로고    scopus 로고
    • 0163-1829 10.1103/PhysRevB.62.1851.
    • H. Sawada and K. Kaeakami, Phys. Rev. B 0163-1829 10.1103/PhysRevB.62. 1851 62, 1851 (2000).
    • (2000) Phys. Rev. B , vol.62 , pp. 1851
    • Sawada, H.1    Kaeakami, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.