A new palladium-free surface activation process for Ni electroless plating on ABS plastic

Materials Letters

Volumn 63, Issue 11, 2009, Pages 840-842

  Tang, Xuejiao ^a   Bi, Chengliang ^a   Han, Changxiu ^a   Zhang, Baogui ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

Nanoparticle; Nickel deposition; Palladium free; SEM; Surface activation; XPS; XRD

Indexed keywords

ABS RESINS; CATALYSIS; CATALYSTS; CHEMICAL ACTIVATION; ELECTROLESS PLATING; NANOPARTICLES; NICKEL ALLOYS; PALLADIUM; PHOTOGRAPHY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOPARTICLE; NICKEL DEPOSITION; SEM; SURFACE ACTIVATION; XPS; XRD;

NICKEL;

EID: 60649119544     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2009.01.006     Document Type: Article

References (20)

1. Chen Y.D., Reisman A., Turlik I., and Temple D. J Electrochem Soc 142 (1995) 3911-3913
2. Toth Z., Szörenyi T., and Toth A.L. Appl Surf Sci 69 (1993) 317-320
3. Seeböck R., Esrom H., Charbonnier M., Romand M., and Kogelschatz U. Surf Coat Technol 142 (2001) 455-459
4. Tang X.J., Cao M., Bi C.L., Yan L.J., and Zhang B.G. Mater Lett 62 (2008) 1089-1091
5. Shipley MG, Sherborn. US Patent 3,874,882.1995.
6. Shipley MG, William A, Conan J. US Patent 3,904,792.1975.
7. Zhang J.Y., Esrom H., and Boyd I.W. Appl Surf Sci 96 (1996) 399-404
8. Omura Y., Renbutsu E., Morimoto M., Saimoto H., and Shigemasa Y. Polym Adv Technol 14 (2003) 35-39
9. Kordás K., Békési J., Vajtai R., Nánai L., Leppävuori S., Uusimäki A., et al. Appl Surf Sci 172 (2001) 178-189
10. Wang X.C., Zheng H.Y., and Lim G.C. Appl Surf Sci 200 (2002) 165-171
11. Seita M., Kusaka M., Nawafune H., and Mizumoto S. Plating Surf Finish 83 (1996) 57-59
12. Brocherieux A., Dessaux O., Goudmand P., Gengembre L., Grimblot J., Brunel M., et al. Appl Surf Sci 90 (1995) 47-58
13. Charbonnier M., Romand M., and Goepfert Y. Surf Coat Technol 200 (2006) 5028-5036
14. Kishi K., and Fujita T. Surf Sci 227 (1990) 107-113
15. Shalvoy R.B., and Reucroft P.J. J Vac Sci Technol 16 (1979) 567-569
16. Matienzo L.J., Yin L.I., Grim S.O., and Swartz W.E. Inorg Chem 12 (1973) 2762-2769
17. Wren A.G., Phillips R.W., and Tolentino C.U. J Colloid Interface Sci 70 (1979) 544-557
18. Cheng C.X. Surf Phys Chem (1995) 676
19. Wang F., Arai S., and Endo M. Carbon 43 (2005) 1716-1721
20. Revesz A., Lendvai J., Loranth J., Padar J., and Bakonyi I. J Electrochem Soc 148 (2001) C715-720