Direct laser writing of nanosized oligofluorene truxenes in UV-transparent photoresist microstructures

Advanced Materials

Volumn 21, Issue 7, 2009, Pages 781-785

  Kuehne, Alexander J C ^a   Elfström, David ^a   Mackintosh, Allan R ^a   Kanibolotsky, Alexander L ^a   Guilhabert, Benoit ^a   Gu, Erdan ^a   Perepichka, Igor F ^b   Skabara, Peter J ^a   Dawson, Martin D ^a   Pethrick, Richard A ^a  

^a UNIVERSITY OF STRATHCLYDE   (United Kingdom)

^b UNIVERSITY OF CENTRAL LANCASHIRE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ETHERS; ORGANIC COMPOUNDS; PHOTORESISTORS; SULFUR COMPOUNDS; SURFACE TREATMENT;

ALTERNATIVE APPROACHES; DIRECT LASER WRITINGS; GLYCIDYL ETHERS; NANO-SIZED; OLIGOFLUORENE; PHOTORESIST MATERIALS; RADIATION DOSE; RATE OF CURES; SOLVATOCHROMIC SHIFTS; TRANSFER MECHANISMS; VINYL ETHERS;

PHOTORESISTS;

EID: 60349085353     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200802656     Document Type: Article

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