Exposure to manufactured nanostructured particles in an industrial pilot plant

Annals of Occupational Hygiene

Volumn 52, Issue 8, 2008, Pages 695-706

  Demou, Evangelia ^a   Peter, Philippe ^a   Hellweg, Stefanie ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

CPC; Exposure; Nanoparticles; Particulate matter

Indexed keywords

AVERAGE CONCENTRATIONS; BACKGROUND LEVELS; BREATHING MASKS; CONCENTRATION LEVELS; CPC; DUSTTRAK; EMISSION SOURCES; EXPOSURE; EXPOSURE CONDITIONS; GAS-PHASE NANOPARTICLES; GAS-PHASE PROCESS; HIGH TEMPERATURES; MASK FILTERS; MITIGATION MEASURES; NANO MATERIALS; NANOSTRUCTURED PARTICLES; NUMBER CONCENTRATIONS; ORDER OF MAGNITUDES; PARTICLE CONCENTRATIONS; PARTICLE NUMBER CONCENTRATIONS; PARTICLE RETENTIONS; PARTICULATE MATTER; PILOT-SCALE PRODUCTIONS; PRODUCTION PLANTS; QUALITATIVE AND QUANTITATIVE ANALYSIS; REAL-TIME PRODUCTIONS; SPATIAL ANALYSIS; SUB-MICRON PARTICLES; WORKER EXPOSURES;

CORROSION PREVENTION; MINING EQUIPMENT; NANOPARTICLES; NANOSTRUCTURES; PILOT PLANTS; QUALITY CONTROL; SOLAR CONCENTRATORS;

PARTICLE SIZE ANALYSIS;

NANOMATERIAL;

AIRBORNE PARTICLE; ARTICLE; CONTROLLED STUDY; EXPOSURE VARIABLE; HIGH TEMPERATURE PROCEDURES; NANOANALYSIS; NANOFABRICATION; OXIDATIVE STRESS; PARTICLE SIZE; PNEUMONIA; PRIORITY JOURNAL; PROTECTIVE EQUIPMENT; SPATIAL AUTOCORRELATION ANALYSIS;

AIR POLLUTANTS, OCCUPATIONAL; ENVIRONMENTAL MONITORING; GASES; HUMANS; NANOPARTICLES; NANOTECHNOLOGY; OCCUPATIONAL EXPOSURE; OCCUPATIONAL HEALTH; PARTICLE SIZE;

EID: 60249099775     PISSN: 00034878     EISSN: 14753162     Source Type: Journal    
DOI: 10.1093/annhyg/men058     Document Type: Article

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