Parylene film for sidewall passivation in SCREAM process

Science in China, Series E: Technological Sciences

Volumn 52, Issue 2, 2009, Pages 357-362

  Ji, Xu ^a   Yu, Huaiqiang ^a   Huang, Xianju ^a   Lei, Yinghua ^a   Li, Zhihong ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

Conformality; Parylene; SCREAM (single crystal reactive etching and metallization) process; Sidewall passivation; Stress

Indexed keywords

ETCHING; FILM GROWTH; METALLIZING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; SINGLE CRYSTALS; STRESSES;

CONFORMALITY; PARYLENE; SCREAM (SINGLE CRYSTAL REACTIVE ETCHING AND METALLIZATION) PROCESS; SIDEWALL PASSIVATION; STRESS;

PASSIVATION;

EID: 59849092783     PISSN: 10069321     EISSN: 1862281X     Source Type: Journal    
DOI: 10.1007/s11431-008-0187-5     Document Type: Article

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