Cross-Bridge Kelvin Resistor structures for reliable measurement of low contact resistances and contact interface characterization

IEEE Transactions on Semiconductor Manufacturing

Volumn 22, Issue 1, 2009, Pages 146-152

  Stavitski, Natalie ^a   Klootwijk, Johan H ^b   Van Zeijl, Henk W ^c   Kovalgin, Alexey Y ^a   Wolters, Rob A M ^a,d  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^d NXP SEMICONDUCTORS   (Netherlands)

Author keywords

Cross Bridge Kelvin Resistor (CBKR); Metal tometal contacts; Specific contact resistance

Indexed keywords

CONTACT RESISTANCE; ELECTRIC RESISTANCE; METAL RECOVERY; METALS; RESISTORS; SHEET METAL; SMELTING;

ACTUAL CURRENTS; CONTACT INTERFACES; CROSS-BRIDGE KELVIN RESISTOR (CBKR); DIFFERENT GEOMETRIES; INTERFACE CHARACTERIZATIONS; MEASUREMENT ACCURACIES; METAL STACKS; METAL-TOMETAL CONTACTS; RELIABLE MEASUREMENTS; SPECIFIC CONTACT RESISTANCE;

STRUCTURAL METALS;

EID: 59849090677     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2008.2010746     Document Type: Conference Paper

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